A photoresist-free patterning technique enables scalable fabrication of two-dimensional heterostructures while preserving the electronic properties of the underlying layers.
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Fig. 1: The fabrication of 2D vdW heterostructures with PROMPT.
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School of Engineering, College of Engineering, Computing & Cybernetics, The Australian National University, Canberra, Australian Capital Territory, Australia
Manuka Suriyage, Ruo-Si Chen & Yuerui Lu
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Manuka Suriyage
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2. Ruo-Si Chen
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3. Yuerui Lu
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Correspondence to Yuerui Lu.
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Suriyage, M., Chen, RS. & Lu, Y. Scalable heterostructures using photoresist-free patterning. Nat Electron (2025). https://doi.org/10.1038/s41928-025-01362-w
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Published:12 March 2025
DOI:https://doi.org/10.1038/s41928-025-01362-w
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